SANTA CLARA, Calif., Dec. 14, 2022 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today announced the commercial availability of “cold field emission” (CFE) technology, a breakthough in eBeam imaging ...
The Surfi-Sculpt E-beam process enables pattern generation without any additives. Many surface modification processes may deposit powders or employ chemicals to achieve a desired pattern on a device’s ...
Today’s leading-edge chip designs require a new class of metrology that goes beyond optical target-based approximation, statistical sampling and single-layer control PROVision® 3E system combines ...
Applied Materials' SEMVision™ H20 system combines the industry’s most sensitive eBeam technology with advanced AI image recognition to enable better and faster analysis of buried nanoscale defects in ...
The IC industry is making a giant leap from planar devices to a range of next-generation architectures, such as 3D NAND and finFETs. But it’s taking longer than expected to ramp up these new ...
Applied’s new “cold field emission” technology works at room temperature, increasing nanoscale image resolution by up to 50% and imaging speed by up to 10X CFE eBeam technology enables leading ...
Applied Materials has introduced a new defect review system to help semiconductor manufacturers continue pushing the limits of chip scaling. The company’s SEMVision H20 system combines sensitive ...
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