TOKYO, December 12, 2024--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of ...

(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...

In lithography, pushing the limits of resolution is what we do. These efforts tend to get a lot of press. After all, the IC technology nodes are named after the smallest nominal dimensions printed ...

The mood at this year’s SPIE Advanced Lithography + Patterning Symposium was decidedly upbeat. The outlook for business is good, due in large measure to expectations of high demand for chips, driven ...

As semiconductor technology advanced from 65nm to 7nm over the last 10 years, new challenges have arisen in design and manufacturing. Securing the IC yield means developing new methods that respond to ...

The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...

Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...

Researchers from the Paul Scherrer Institute, Laboratory of X-ray Nanoscience and Technologies, developed a method for producing denser circuit patterns. Modern microchips feature conductive tracks ...