SAN JOSE, Calif. — Lam Research Corp. has rolled out the 2300 Motif, a post-lithography pattern enhancement system. Based on a proprietary plasma-assisted process, the new system delivers ...
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
From its origins more than 200 years ago as an efficient way to publish theatrical works, lithographic printing has grown to be the preferred method for a vast range of print projects. Currently, the ...
The first full-scale prototype machine for making ICs by using extreme-ultraviolet (EUV) light has been completed, proving that the technology works. This breakthrough should lead to microprocessors ...
- Supports 1.4nm Generation Semiconductors, Reduces Manufacturing Costs and Energy Consumption - Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the development of a nanoimprint ...
What Is Electron Beam Lithography? Electron beam lithography (EBL) is a technique for creating high-resolution patterns on a semiconductor substrate by directing a beam of electrons to selectively ...
Researchers have demonstrated a novel way to inscribe microscopic patterns on living organisms, using the resilient tardigrade as a model. The study, published in Nano Letters, explores a technique ...
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