We present a method for submicron fabrication of flexible, thin-film structures fully encapsulated in biocompatible polymer poly(chloro-p-xylylene) (Parylene C) that ...

Why it matters: Canon has shipped the first example of its nanoimprint lithography equipment to an American research consortium, marking a significant milestone in the commercialization of this ...

The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...

It’s the worst-kept secret in the industry. Extreme ultraviolet (EUV) lithography has missed the initial stages of the 10nm logic and 1xnm NAND flash nodes. Chipmakers hope to insert EUV by the latter ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

In a milestone for the global semiconductor industry, Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better. Their new ...

Four of the largest semiconductor companies are planning to move to ASML's EUV lithography technology in the next two years. Customers of EUV will be able to manufacture chips with a significantly ...

Multipatterning challenges are forcing design teams to work much more closely with manufacturing—and to absorb some of the costs. The days when chip designers could throw tape “over the wall” to the ...